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Nanopositioning and Nonlinearity Compensation for Step Imprint Lithography Tool

LU Bing-heng, LIU Hong-zhong, DING Yu-cheng, WANG Li, QIU Zhi-hui

Frontiers of Mechanical Engineering 2006, Volume 1, Issue 1,   Pages 6-13 doi: 10.1007/s11465-005-0003-x

Abstract:

In this paper, the motion mode and nanopositioning accuracy in the step imprinting lithography process

Keywords： different     nonoscillatory     nonlinearity     integral derivative     positioning    

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High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens Article

Yueqiang Hu, Ling Li, Rong Wang, Jian Song, Hongdong Wang, Huigao Duan, Jiaxin Ji, Yonggang Meng

Engineering 2021, Volume 7, Issue 11,   Pages 1623-1630 doi: 10.1016/j.eng.2020.08.019

Abstract: Lithography in the near field using the surface plasmon polariton (i.e., plasmonic lithography) providesParallel lithography of the nanostructures with the smallest ( around 26 nm) linewidth is obtained with

Keywords： Nanofabrication     Surface plasmon polariton     Lithography     Plasmonic flying head     Plasmonic lens    

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Title Author Date Type Operation

Nanopositioning and Nonlinearity Compensation for Step Imprint Lithography Tool

LU Bing-heng, LIU Hong-zhong, DING Yu-cheng, WANG Li, QIU Zhi-hui

Journal Article

Extreme Ultraviolet Lithography Systems (English)

10 Dec 2022

Conference Videos

Extreme Ultraviolet Lithography Systems (Chinese)

7 Dec 2022

Conference Videos

High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

Yueqiang Hu, Ling Li, Rong Wang, Jian Song, Hongdong Wang, Huigao Duan, Jiaxin Ji, Yonggang Meng

Journal Article